Copolymers having o-nitrocarbinol ester groups, production...

Details Copolymers having o-nitrocarbinol ester groups, production... Copolymers having o-nitrocarbinol ester groups, production...

C - Chemistry, Metallurgy

08

F

96/222, 402/8

C08F 220/36 (2006.01) C08F 220/26 (2006.01) C08F 222/22 (2006.01) C08F 230/08 (2006.01) G03F 7/039 (2006.01) G03F 7/095 (2006.01)

Patent

CA 1292339

Abstract of the Disclosure: Copolymers useful in par- ticular for producing two-layer resists and fabricating semiconductor devices contain from 5 to 50 mol % of monomers having o-nitrocarbinol ester groups, from 95 to 50 mol % of an olefinically unsaturated silicon-containing organic compound, from 0 to 20 mol % of an olefinically unsaturated carboxylic acid and from 0 to 25 mol % of other copolymerizable monomers.

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