C - Chemistry – Metallurgy – 23 – F
Patent
C - Chemistry, Metallurgy
23
F
149/14
C23F 1/18 (2006.01) C09K 13/04 (2006.01) H05K 3/06 (2006.01)
Patent
CA 1274455
ABSTRACT Process and solution for etching copper, for example, to remove it from printed circuit boards. The etching is effected by an aqueous solution of nitric acid, a polymer which inhibits undercutting of the copper, a surfactant, and sulfuric acid and/or an alkane sulfonic acid such as methane sulfonic acid.
512260
Psi Star
Smart & Biggar
LandOfFree
Copper etching process and solution does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Copper etching process and solution, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Copper etching process and solution will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1274207