C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 235/28 (2006.01) A61K 8/68 (2006.01) C07C 235/08 (2006.01) C07F 9/113 (2006.01) C07H 15/10 (2006.01)
Patent
CA 2041265
ABSTRACT Novel amide derivatives have the following structure (1): Image (1) where Y is hydrogen or an unsaturated fatty acid residue, A is an hydroxyalkyl group, B is a sugar or phosphate residue, and (CaHb) is a hydrocarbon residue with from 7 to 49 carbon atoms. The amide derivative can be employed in compositions, together with a suitable carrier, for topical application, particularly to improve damaged human skin or hair.
Bereskin & Parr Llp/s.e.n.c.r.l.,s.r.l.
Plc Unilever
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