Cotelomer compounds

C - Chemistry – Metallurgy – 08 – F

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

31/59, 260/501.6

C08F 2/38 (2006.01) C02F 5/14 (2006.01) C08F 220/04 (2006.01) C23F 11/173 (2006.01) C25D 11/24 (2006.01)

Patent

CA 1328885

- 1 - Abstract of the Disclosure COTELOMER COMPOUNDS New cotelomer compounds having the formula I Image (I) and salts thereof wherein A is a random polymeric residue comprising at least one unit of formula II Image (II) and at least one unit of formula III, different from a unit of formula II, Image (III) and B is hydrogen or a residue A; wherein m and n are integers such that the sum of m + n is an integer of from 3 to 100, the ratio of n : m being from 99 to 1: 1 to 99, provided that the resulting telomers are water-soluble and wherein m and/or n in a residue A may be the same as or different from m and/or n in a residue B; R is hydrogen, methyl or ethyl; R1 is a residue -OX, wherein X is hydrogen, an alkali- or alkaline earth metal, ammonium or an amine residue; - 2 - R2 is a hydrogen, methyl or a residue -CO2R5, wherein R5 is hydrogen or a straight- or branched chain alkyl residue having 1 to 8 carbon atoms optionally substituted by a hydroxy group; R3 is hydrogen, a straight- or branched chain alkyl residue having 1 to 4 carbon atoms, hydroxymethyl or a residue -CO2R6, wherein R6 is hydrogen, a residue of formula Image a residue of formula -[CH2-CH(R9)O] H, in which R9 is hydrogen, methyl or phenyl and z is an integer from 1 to 20, or R6 is a straight- or branched chain alkyl residue having 1 to 8 carbon atoms and optionally substituted by a hydroxy group or by a group SO3M in which M is hydrogen or an alkali- or alkaline earth metal atom; R4 is a residue -CO2R6 (wherein R6 has its previous significance), a straight- or branched alkyl residue having 1 to 8 carbon atoms optionally substituted by one or two carboxylic acid groups, a phenyl residue, an acetyl residue, hydroxymethyl, an acetomethyl residue, -SO3M, -CH2SO3M or -PO3M2, in which M is hydrogen or an alkali metal or alkaline earth metal atom, a residue -CONR7R8, wherein R7 and R8 are the same or different and each is hydrogen, a straight- or branched chain alkyl residue having 1 to 8 carbon atoms, hydroxymethyl or a residue -CH(OH)CO2M, -C(CH3)2CH2SO3M or -C(CH3)2CH2PO3M2, wherein M has its previous significance, or -N(R10)COCH3, in which R10 is hydrogen or C1-C4 straight or branched chain alkyl group. Compounds I are useful as corrosion and/or scale inhibitors in aqueous systems, as agents for facilitating dispersion of particulate matter in aqueous systems and as sealing smut inhibitors in processes for sealing anodically produced oxide layers on aluminium surfaces.

471913

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Cotelomer compounds does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Cotelomer compounds, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cotelomer compounds will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1200175

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.