C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/280, 260/305
C07D 233/90 (2006.01) A01N 43/50 (2006.01) C07D 401/04 (2006.01)
Patent
CA 2007173
O.Z. 0050/40527 ABSTRACT OF THE DISCLOSURE: 1-Aryl- and 1-hetarylimidazolecarboxylic esters of the general formulae Ia and Ib Image Image Ia Ib where R1 is halogen or substituted or unsubstituted C1-C4-alkyl; R2 is substituted or unsubstituted C1-C6-alkyl; C3-C6-alkenyl, C3-C6-alkynyl or C3-C6-cycloalkyl; R3 is hydrogen or C1-C4-alkyl; R4 is substituted or unsubstituted phenyl or 5- or 6-membered heteroaromatic, processes for their manufacture, and agents containing them.
Hamprecht Gerhard
Koehler Hermann
Wriede Ulrich
Wuerzer Bruno
Basf Aktiengesellschaft
Robic Robic & Associes/associates
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