Cross-linked polyalkenyl phenol based photoresist compositions

Details Cross-linked polyalkenyl phenol based photoresist compositions Cross-linked polyalkenyl phenol based photoresist compositions

G - Physics

03

F

96/177

G03F 7/038 (2006.01) G03F 7/023 (2006.01)

Patent

CA 1218553

ABSTRACT A film forming, radiation sensitive resist composition having improved thermal stability and a reduced dissolution rate in developer solutions, comprised of a sensitizer and a polyalkenyl phenol such as a polyvinyl phenol cross-linked, prior to irradiation, with a poly- functional cross-linking agent such as dimethylol p- cresol or hexamethylene tetramine.

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