G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/027 (2006.01) C08F 265/04 (2006.01) C08F 290/14 (2006.01) G03F 7/028 (2006.01) G03F 7/033 (2006.01) H05K 3/00 (2006.01) H05K 3/18 (2006.01)
Patent
CA 2079377
47 ABSTRACT OF THE DISCLOSURE A photopolymerizable or radiation polymerizable alkaline developing crosslinking curable resin composition possessing superior antiplating properties and a short stripping period, in which the stripped plate is not easily dissolved in the stripping fluid, and which is comprising: (a) 5-30 parts by weight of at least one compound possessing in one molecule on the average 1.5 or more (meth)acryloyloxy groups, which is obtained by reacting (meth)acrylic acid with a reaction product formed by adding, to a polyatomic alcohol possessing 3 or more OH groups in one molecule, an alkylene oxide containing propylene oxide in an amount of 67% molar or greater in an amount of 5-12 moles per mole of OH group in the aforementioned polyatomic alcohol, (b) 5-30 parts by weight of at least one crosslinkable monomer other than that stated above in (a), possessing in one molecule 2 or more ethylenically unsaturated groups, (c) 45-75 parts by weight of a thermoplastic polymer for use as a binder, the thermoplastic polymer in turn being formed of 15-35 wt % of at least one .alpha.,.beta.-unsaturated carboxyl group containing a monomer having 3-15 carbon atoms, and 65-85 wt % of another copolymerizable monomer, and (d) 0-10 parts by weight of a photopolymerization initiator.
Inukai Ken-Ichi
Iseki Takayuki
Koyanagi Seiya
Kushi Kenji
Miyazaki Seiji
Goudreau Gage Dubuc
Mitsubishi Rayon Co. Ltd.
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