Cryogenic process for the production of an oxygen-free and...

F - Mech Eng,Light,Heat,Weapons – 25 – J

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F25J 1/02 (2006.01) F25J 3/04 (2006.01)

Patent

CA 2060221

PATENT 211PUS04363 ABSTRACT The present invention relates to a process for the production of kryton and xenon by using an oxygen-free vapor stream to strip a liquid stream containing oxygen, krypton, methane, and xenon of methane and oxygen. This is accomplished by properly controlling the liquid to vapor flow ratio in the distillation column so that such ratio is less than 0.15. A suitable reflux liquid is used to decrease the loss of krypton and xenon in the methane and oxygen laden vapor stream leaving the distillation system.

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