C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 491/056 (2006.01) A61K 31/55 (2006.01) C07D 317/58 (2006.01) C07D 491/04 (2006.01) C07D 493/04 (2006.01)
Patent
CA 2157248
A physical form of having an X-ray powder diffraction pattern with d spacings at 12.78, 9.48, 8.99, 8.4, 8.23, 6.39, .27, 5.73, 4.01 and 3.96 .ANG.. The compound is useful as an AMPA antagonist.
Anderson Benjamin Alan
Groleau Edward Grant
Hansen Marvin Martin
Varie David Lee
Vicenzi Jeffrey Thomas
Eli Lilly And Company
Gowling Lafleur Henderson Llp
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