Curable compositions of polyether sulfone or polyether...

C - Chemistry – Metallurgy – 08 – G

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402/33, 402/349,

C08G 65/40 (2006.01) C08G 59/04 (2006.01) C08G 59/30 (2006.01) C08G 65/48 (2006.01) C08G 73/12 (2006.01) C08G 75/23 (2006.01) C08J 5/24 (2006.01) C08L 63/00 (2006.01) C08L 71/00 (2006.01)

Patent

CA 1318447

K-16873/= Curable compositions of polyether sulfone or. Polyether ketone copolymers and unsaturated imides Abstract of the Disclosure The invention relates to curable compositions comprising a) a copolyether resin having end groups -OR1 linked direct to phenyl nuclei and containing 1 to 50 mol% of repeating structural units of formula I Image (I), and 99 to 50 mol% of repeating structural units of formula II Image ( II), wherein Rl is hydrogen, a phenylene radical substituted by amino groups or ethylenically unsaturated radicals or is a 2,3-epoxypropyl radical, R2 is a direct C-C bond or a group of formula -CRH2R-,-O-,-S-,-CO-or -SO2-, r is 1 to 20, R3 is hydrogen or methyl, R4, R5 and R7 are inert substituents, m, n and o are each independently 0, 1 or 2, p is 1 or 2, R6.is a radical of a bisphenol, X and Y are -SO2-or -C0-, and b) at least one compound of formula VIII, IX or X Image (VIII), Image (IX), Image (x), wherein A forms a maleimidyl nadicimidyl, allylnadicimidyl or methallylnadic- imidyl system, and Rl4 and Rl5 are mono- or divalent aliphatic, cyclo- aliphatic, aromatic or heterocyclic radicals, and Rl6 is an aromatic radical of valency t and t is an integer from 3 to 12. The compounds can be used as matrix resins for the preparation of fibrous composite structures.

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