Curing and passivation of spin-on-glasses by a plasma...

Details Curing and passivation of spin-on-glasses by a plasma... Curing and passivation of spin-on-glasses by a plasma...

H - Electricity

01

L

356/142, 345/5,

H01L 21/469 (2006.01) H01L 21/316 (2006.01) H01L 21/768 (2006.01) H01L 23/29 (2006.01)

Patent

CA 1339817

A method of producing insulating layers over a semiconductor substrate comprising spinning a film of spin-on-glass (SOG) over a semiconductor substrate, precuring the film of SOG at an elevated temperature sufficient to remove the bulk of solvent and curing the film of SOG in a plasma in a plasma reactor of a type exhibiting a self-biased RF discharge adjacent the SOG for a period of time sufficient to exclude the bulk of SiOH, organic volatiles and H2O from the layer.

601333

Affiliated with

Also associated with

Rating

Curing and passivation of spin-on-glasses by a plasma... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Curing and passivation of spin-on-glasses by a plasma..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Curing and passivation of spin-on-glasses by a plasma... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1238671