Cvd apparatus containing single u-shaped discharge electrode...

Details Cvd apparatus containing single u-shaped discharge electrode... Cvd apparatus containing single u-shaped discharge electrode...

C - Chemistry, Metallurgy

23

C

C23C 16/50 (2006.01) C23C 16/509 (2006.01) H01J 37/32 (2006.01) H05H 1/48 (2006.01)

Patent

CA 2041495

A plasma CVD apparatus whose discharge electrode is a single line member bent in a U shape in an alternating manner and in which a substrate to be processed is held substantially in parallel to the discharge electrode. The electric field around the electrode becomes stronger and the intensity distribution of this field becomes even. As a result, a product film formed on the substrate surface has a uniform thickness, and the film can be formed at high speeds.

Appareil de dépôt de plasma en phase vapeur dont l'électrode de décharge est constituée d'un seul élément, plié en U de façon alternative. Le substrat à traiter est placé dans l'appareil essentiellement parallèlement à l'électrode de décharge. Le champ électrique autour de l'électrode est accru et l'intensité de distribution du champ est égalisée. Le film résultant, qui peut être déposé à haute vitesse sur la surface du substrat, est d'épaisseur uniforme.

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