Cyclic carbonate compounds, method for producing the same...

C - Chemistry – Metallurgy – 07 – C

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C07C 69/96 (2006.01) G03F 7/004 (2006.01) G03F 7/039 (2006.01)

Patent

CA 2092783

ABSTRACT OF THE DISCLOSURE This invention provides a process for produc- ing a cyclic carbonate compound represented by the following formula (5): (5) Image or the like which is useful as a dissolution inhibitor for use in a chemically amplified positive photoresist, as well as a positive photoresist composition comprising said cyclic carbonate compound, an alkali-soluble resin and a photo-induced acid precursor. This composition gives a positive photoresist excellent in performances such as resolution, profile, sensitivity, etc.

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