C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 69/96 (2006.01) G03F 7/004 (2006.01) G03F 7/039 (2006.01)
Patent
CA 2092783
ABSTRACT OF THE DISCLOSURE This invention provides a process for produc- ing a cyclic carbonate compound represented by the following formula (5): (5) Image or the like which is useful as a dissolution inhibitor for use in a chemically amplified positive photoresist, as well as a positive photoresist composition comprising said cyclic carbonate compound, an alkali-soluble resin and a photo-induced acid precursor. This composition gives a positive photoresist excellent in performances such as resolution, profile, sensitivity, etc.
Kusumoto Takehiro
Takeyama Naoki
Ueda Yuji
Ueki Hiromi
Fetherstonhaugh & Co.
Sumitomo Chemical Co. Ltd.
LandOfFree
Cyclic carbonate compounds, method for producing the same... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Cyclic carbonate compounds, method for producing the same..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cyclic carbonate compounds, method for producing the same... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-2045198