C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
260/242, 402/247
C08G 65/02 (2006.01) C07C 49/84 (2006.01) C07D 323/00 (2006.01) C07D 327/00 (2006.01) C07D 341/00 (2006.01) C08G 65/40 (2006.01) C08L 71/00 (2006.01) C08L 71/12 (2006.01)
Patent
CA 2023269
ABSTRACT The present invention is directed to cyclic poly(aryl ether) oligomers and mixtures thereof, and methods for the preparation thereof in a highly dilute reaction medium under reaction conditions favorable for ring closure at low degrees of polymerization. These oligomers are represented by the general formula Image where each Y is divalent oxygen or divalent sulfur, each Ar is an aromatic diradical which comprises one or more C6 to C20 arylene groups and has at least one electron withdrawing group attached to an aromatic ring, and n is an integer from 1 to 20 with the proviso that for integer values of n equal to 1 or 2 all linkages between independent aromatic rings comprise at least one atom. The present invention includes a process for the preparation of poly(aryl ethers) from cyclic poly(aryl ether) oligomers. These low melt viscosity cyclic oligomers undergo ring opening and chain extension upon heating in the presence of a catalyst, 37,163B-F forming high molecular weight linear polymers with no coproduct formation. Finished thermoplastic parts and composites may be prepared using this technology with processing techniques normally restricted to thermosetting monomers. 37,163B-F
Mullins Michael J.
Woo Edmund P.
Mullins Michael J.
Smart & Biggar
The Dow Chemical Company
Woo Edmund P.
LandOfFree
Cyclic poly(arylether) oligomers, a process for preparation... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Cyclic poly(arylether) oligomers, a process for preparation..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cyclic poly(arylether) oligomers, a process for preparation... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1753928