Cycloaliphatic acrylic monomer

C - Chemistry – Metallurgy – 07 – D

Patent

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Details

C07D 319/06 (2006.01) A61K 6/083 (2006.01) C08F 20/28 (2006.01) C08F 120/18 (2006.01) C08G 65/22 (2006.01) C08G 65/332 (2006.01) C09D 4/00 (2006.01) C09D 133/08 (2006.01) C09J 4/00 (2006.01)

Patent

CA 2152910

Cycloaliphatic acrylic monomer having general formula (I) in which formula R1 is H, CH3, HO, HO-(R3)n or (a) and R2 is (b) wherein R3 is C2H4O, C3H6O,C4H8O, C8H8O or combinations thereof, R4 is H or CH3 and wherein the mean value n for n is 1-24. The acrylic monomer is based on ethoxylated, propoxylated, butoxylated and/or phenylethoxylated 1,3-dioxane alcohols and constitutes 0.1-80 % by weight, preferably 5-0 % by weight, of a radiation curing composition.

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