C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/273.5
C07D 471/04 (2006.01) C07D 209/88 (2006.01) C07D 217/04 (2006.01)
Patent
CA 1160228
RAN 4085/3 Abstract The novel cycloalka[4,5]pyrrolo[2,3-g]isoquinolines of the general formula Image wherein R1 is hydrogen, alkyl, acyl or aralkyI; R2 is hydrogen, alkyl, hydroxyalkyl, arylhydroxyalkyl, alkoxyalkyl, acyloxyalkyl, acylalkyl, aralkyl, alkenyl, cycloalkyl-alkyl, alkynyl, thienyl-alkyl, furyl-alkyl, arylcarboxamidoalkyl, ar- alkenyl, alkenyloxyalkyl, aryloxyalkyl, aralkyloxyalkyl, or aryl-N-imidazolonylalkyl; X is O or S; and n is 3, 4, 5 or 6; and their optical and geometric isomers as well as their pharma- ceutically acceptable acid addition salts exhibit neuroleptic activity and are useful antipsychotic agents for the treatment of schizophrenia. These compounds can be prepared by various processes starting from partlynovel intermediates.
371766
Berger Leo
Olson Gary L.
Gowling Lafleur Henderson Llp
Hoffmann-La Roche Limited
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