C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/515.3, 260/4
C07C 59/86 (2006.01) C07C 69/738 (2006.01) C07C 279/14 (2006.01)
Patent
CA 1113114
ABSTRACT OF THE DISCLOSURE Novel cycloalkylidenemethylphenylacetic acid deri- vatives which are of the formula Image (I) wherein R1 is alkyl having 1 to 6 carbon atoms; R2 is hydrogen or C1 to C6 alkyl and n is 1, 2 or 3 and pharmaceutically accept- able salts thereof are useful as anti-inflammatory, analgesic or anti-pyretic agents. The derivatives (1) may be prepared by condensing a compound Image (II) (wherein R1 is as defined and R3 is C1 to C6 alkyl) with a compound Image (V) (wherein n is as defined) or an enamine derivative thereof. Control of the process conditions gives the desired compound where- in R2 is R3 or hydrogen.
309215
Misaka Eiichi
Tanaka Shigeru
Terada Atsusuke
Marks & Clerk
Sankyo Company Limited
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