C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 473/00 (2006.01) A61K 31/52 (2006.01) A61K 31/53 (2006.01) A61K 31/695 (2006.01) C07C 215/44 (2006.01) C07C 223/04 (2006.01) C07C 225/20 (2006.01) C07C 271/24 (2006.01) C07C 333/00 (2006.01) C07D 239/46 (2006.01) C07D 239/54 (2006.01) C07D 487/04 (2006.01) C07F 7/10 (2006.01) C07F 7/18 (2006.01)
Patent
CA 2052315
ABSTRACT Cyclobutane derivatives represented by the formula (1) Image (1) wherein B is a nucleic acid base derivative, R1 denotes a lower alkyl group of 1 to 6 carbon atoms, and R2 and R3 each independently denote hydrogen atom or a protect- ing group for hydroxyl, and physiologically acceptable salts thereof. These compounds are expectedly useful as medicinal agents such as antiviral agent, carcinostatic agent and the like.
Ikeda Ryuji
Nagai Masashi
Sagawa Yukihiro
Shiozawa Akira
Ikeda Ryuji
Marks & Clerk
Nagai Masashi
Nippon Kayaku Kabushiki Kaisha
Sagawa Yukihiro
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