Cycloheptene derivatives

Details Cycloheptene derivatives Cycloheptene derivatives

C - Chemistry, Metallurgy

07

D

260/202.5

C07D 295/02 (2006.01) C07D 295/03 (2006.01)

Patent

CA 1160219

RAN 4016/17 Abstract The novel cycloheptene derivatives of the general formula Image I wherein R1 signifies lower alkyl, the dotted line signifies an optional bond and n signifies the number 1, 2 or 3, and either R2 signifies hydrogen or lower alkyl and R3 signifies lower alkyl or R2 and R3 together with the nitrogen atom signify a 5- or 6-membered heterocycle, and their pharmaceutically acceptable acid addition salts have valuable histamine-H1 antagonistic properties and are suitable for the control or prevention of allergic reactions such as urticaria, hay fever, anaphylaxis and over-sensitivity to medicaments. These compounds can be manufactured according to various processes starting from partly novel starting materials and can be brought into galenical administration forms.

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