Cyclohexenol derivatives and their use for controlling...

Details Cyclohexenol derivatives and their use for controlling... Cyclohexenol derivatives and their use for controlling...

C - Chemistry, Metallurgy

07

D

260/328, 260/387

C07D 309/06 (2006.01) A01N 35/10 (2006.01) A01N 37/10 (2006.01) A01N 37/38 (2006.01) A01N 39/02 (2006.01) A01N 41/04 (2006.01) A01N 43/08 (2006.01) A01N 43/14 (2006.01) A01N 43/16 (2006.01) A01N 43/18 (2006.01) A01N 43/40 (2006.01) A01N 43/80 (2006.01) A01N 43/90 (2006.01) A01N 53/00 (2006.01) A01N 55/00 (2006.01) A01N 57/12 (2006.01) C07D 213/53 (2006.01) C07D 261/18 (2006.01) C07D 307/14 (2006.01) C07D 309/10 (2006.01) C07D 335/02 (2006.01) C07D 405/12 (2006.01) C07D 407/12 (2006.01) C07D 409/12 (2006.01)

Patent

CA 1250293

ABSTRACT OF THE DISCLOSURE: The invention relates to new cyclohexenol derivatives of the formula (I): Image (I) wherein R1 is a tetrahydropyran radical, a tetrahydro- thiopyran radical a 1-oxo-tetrahydrothiopyran radical or a 1,1-dioxo-tetrahydropyran radical, X is hydrogen or methoxy- carbonyl, R2 is alkyl atoms, R3 is alkyl alkenyl, haloalkenyl, or propargyl, and A is a radical of the general structure DE, where D is methylene, CO or SO2 and E is an alkyl or alkenyl radical of not more than 20 carbon atoms, unsubstituted or methyl-substituted cycloalkyl, or styryl, or is a phenyl or benzyl radical which is unsubstituted or substituted, or is a 1-methylbenzyl or 1,1-dimethylbenzyl radical which is unsubstituted or substituted, or is haloalkyl, C1-C4-alkoxymethyl, acetoxymethyl or alkoxycarbonylalkyl, or is phenoxyalkyl which is unsubstituted or substituted in, and which possesses a straight-chain or branched alkylene chain of not more than 5 carbon atoms, or A is a radical of the formula: Image where R4 is phenyl which is substituted by trifluoromethyl, halogen or alkyl, or A is a radical of the formula: Image where R5 and R6 are each halogen or CF3. These derivatives can be used for controlling unwanted plants growth.

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