C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/468, 260/477
C07D 295/18 (2006.01) C07D 307/00 (2006.01)
Patent
CA 1044235
ABSTRACT OF THE DISCLOSURE The present invention is concerned with novel cyclo- pentene and cyclopentane derivatives of the general formula: Image .....I wherein R and R2 each individually represent a hydrogen atom or a lower alkyl group; R3 represents a lower alkyl group; R3 and R4 each individually represent a lower alkyl or aralkyl group wherein the alkyl moiety is lower alkyl and the aryl moiety is a phenyl group or the saturated heterocyclic ring represented by Image has the formula: Image wherein R3 and R4 each individually represent an alkylene group which contains 2 carbon atoms, Z is an oxygen atom or a nitrogen atom and n is 0 or 1; R5 in OR5 represents a hydrogen atom, a lower alkyl group, an acyl group having the formula lower alkyl -CO- or a carbamoyl group having the formula R? -NHCO- wherein R4 is a lower alkyl group, a phenyl group or a phenyl group substituted by halogen, -NO2 or -CF3; which have pharmacological, particularly analgesic and anti- inflammatory activity, and are also useful intermediates in the preparation of other pharmacologically active compounds.
218822
Hughes Lise A.
Kubela Rudolf
Delmar Chemicals Limited
Na
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