C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/277.3, 260/2
C07D 401/10 (2006.01) C07D 215/22 (2006.01) C07D 221/16 (2006.01)
Patent
CA 1037044
ABSTRACT OF THE DISCLOSURE New cyclopenteno-quinolone derivatives, and their pre- paration, of the formula(I): Image (I) wherein R is a saturated or unsaturated aliphatic lower-hydro- carbon radical, X is a hydrogen atom or a lower alkyl radical and Y is a halogen atom or an azido, lower-alkylthio, lower- alkyl-sulphonyl or nitrile radical or an unsubstituted or substituted amino group, and the pharmaceutically acceptable and pharmacologically compatible salts thereof, the derivatives in comparison with the known compounds have about the same anti- microbial action in vitro but a substantially stronger action in vivo, especially in the urinary tract.
213661
Berger Herbert
Rhomberg Alfred
Sauer Winfriede
Stach Kurt
Vomel Wolfgang
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