C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 261/08 (2006.01) A01N 53/00 (2006.01) C07C 233/60 (2006.01) C07D 231/12 (2006.01) C07D 233/54 (2006.01) C07D 249/08 (2006.01) C07D 271/10 (2006.01) C07D 275/02 (2006.01) C07D 277/30 (2006.01) C07D 285/12 (2006.01) C07D 333/24 (2006.01)
Patent
CA 2060606
O.Z. 0050/42196 ABSTRACT OF THE DISCLOSURE: Cyclopropane(thio)carboxamides of the general formula I Image I where the index and the substituents have the following meanings: n is 0, 1 or 2, it being possible for the R2 radicals to be different when n is 2; A1 and A2 are substituted or unsubstituted alkylene; R1 is hydrogen, halogen or alkyl; R2 is halogen or alkyl; X is substituted or unsubstituted 5-membered heteroaryl, substituted or unsubstituted pyrazolyl-1-oxy or triazolyl-1-oxy; and Y is oxygen or sulfur, processes for their manufacture, intermediates therefor, and the use of compounds 1.
Kardorff Uwe
Krieg Wolfgang
Kuenast Christoph
Nuebling Christoph
Theobald Hans
Basf Aktiengesellschaft
Kardorff Uwe
Krieg Wolfgang
Kuenast Christoph
Nuebling Christoph
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