C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
31/105, 260/261,
C07C 43/184 (2006.01) C07C 43/21 (2006.01) C07C 69/92 (2006.01) C07D 213/30 (2006.01) C07D 213/55 (2006.01) C07D 239/24 (2006.01) C07D 239/26 (2006.01) C07D 239/34 (2006.01) C09K 19/30 (2006.01) C09K 19/34 (2006.01)
Patent
CA 2016632
HOE 89/F 145 Abstract of the disclosure Cyclopropylalkyl or -alkenyl compounds, processes for their preparation, and their use in liquid-crystalline mixtures The novel cyclopropylalkyl or -alkenyl compounds have the general formula Image In this formula, the symbols A1, A2 and A3 are unsub- stituted or, in particular, substituted (by halogens or CN), aromatic or heteroaromatic molecular building blocks, such as 1,4-phenylene or pyrimidine-2,5-diyl, which are linked via a single bond or via functional groups M1 and/or M2, such as CO-O or CH2-O; H and m are zero or 1; j, 1 and n are zero, 1 or 2. The radicals R2, R3 and R4 are H or alkyl/alkenyl, R1 is alkyl/alkenyl or one of the substituents known from LC chemistry, such as an .alpha.-haloalkanoic acid radical. G is alkylene or alkenylene.
de Meijere Armin
Dubal Hans-Rolf
Escher Claus
Harada Takamasa
Hemmerling Wolfgang
de Meijere Armin
Dubal Hans-Rolf
Escher Claus
Fetherstonhaugh & Co.
Harada Takamasa
LandOfFree
Cyclopropylalkyl or -alkenyl compounds, processes for their... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Cyclopropylalkyl or -alkenyl compounds, processes for their..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cyclopropylalkyl or -alkenyl compounds, processes for their... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1424234