Cylindrical cathode for magnetically-enhanced sputtering

Details Cylindrical cathode for magnetically-enhanced sputtering Cylindrical cathode for magnetically-enhanced sputtering

H - Electricity

01

J

204/96.08, 204/1

H01J 37/34 (2006.01)

Patent

CA 1181362

ABSTRACT OF THE DISCLOSURE In this cylindrical, magnetically-enhanced, sputtering catho- de, the magnetic field at the cathode target is generated by apply- ing an electric current through a hollow electrical conductor dis- posed within a tubular target, so that the electric current flowing along this conductor induces circular magnetic lines concentrical- ly around its axis. By biasing negatively the tubular target immers- ed in a low pressure gas, a glow discharge is generated. Electrons, emitted from the target surface are accelerated radially by the elec- tric field, but deviated perpendicularly by the magnetic field. The resulting motion is confined in a spirally-shaped area centered on the conductor axis.

429510

Affiliated with

Also associated with

Rating

Cylindrical cathode for magnetically-enhanced sputtering does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Cylindrical cathode for magnetically-enhanced sputtering, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cylindrical cathode for magnetically-enhanced sputtering will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1293322