Deep-uv lithography

Details Deep-uv lithography Deep-uv lithography

G - Physics

03

F

356/177, 356/192

G03F 7/20 (2006.01) G02B 27/00 (2006.01)

Patent

CA 1252228

- 1 - Abstract: The present invention relates to an apparatus and method for optical lithography. The apparatus is comprised of stationary equipment including a laser source and equipment including a stepping table physically separated from the stationary equipment. A unit is provided for directing signals from the laser source in the stationary equipment to the second mentioned equipment to maintain a prescribed alignment between the direction of propagation of the signals and the second-mentioned equipment even during movement of the second-mentioned equipment due to stepping of the table.

553493

Affiliated with

Also associated with

Rating

Deep-uv lithography does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Deep-uv lithography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Deep-uv lithography will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1173870