Deep-uv lithography

Details Deep-uv lithography Deep-uv lithography

H - Electricity

01

L

356/177, 356/192

H01L 21/428 (2006.01) G03F 7/20 (2006.01)

Patent

CA 1232373

- 23 - DEEP-UV LITHOGRAPHY Abstract A deep-UV step-and-repeat photolithography system includes a narrow-bandwidth pulsed excimer laser illumination source and an all-fused-silica lens assembly. The system is capable of line definition at the 0.5- micrometer level. One significant feature of the system is its ability to perform wafer focus tracking by simply changing the frequency of the laser.

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