Deep uv sensitive photoresist resistant to latent image decay

Details Deep uv sensitive photoresist resistant to latent image decay Deep uv sensitive photoresist resistant to latent image decay

G - Physics

03

F

G03F 7/039 (2006.01) G03F 7/004 (2006.01) G03F 7/022 (2006.01)

Patent

CA 2111633

DEEP UV SENSITIVE PHOTORESIST RESISTANT TO LATENT IMAGE DECAY ABSTRACT A positive working deep UV sensitive photoresist which provides improved critical dimension stability during prolonged periods of post exposure delay before baking comprises an acid stable polymer which is insoluble in water but normally soluble in an aqueous alkaline medium, a photo acid generator exemplified by the tri-(2,1,4-diazonaphthoquinonesulfonate) ester of 3,5- dinitro-2,6-dimethylol para cresol, and a mixed carbonate ester of tertiary butyl alcohol and a polyhydric phenol which is an acid labile compound which inhibits the dissolution of the normally soluble polymer in said alkaline medium.

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