Deep uv sensitive photoresist resistant to latent image decay

Details Deep uv sensitive photoresist resistant to latent image decay Deep uv sensitive photoresist resistant to latent image decay

G - Physics

03

F

G03F 7/039 (2006.01) G03F 7/004 (2006.01) G03F 7/40 (2006.01) H01L 21/027 (2006.01) H01L 21/461 (2006.01) H01L 21/47 (2006.01) H01L 21/70 (2006.01)

Patent

CA 2089722

2181-35-24 PATENT DEEP UV SENSITIVE PHOTORESIST RESISTANT TO LATENT IMAGE DECAY ABSTRACT OF THE DISCLOSURE A positive working deep UV sensitive photoresist which provides improved critical dimension stability during prolonged periods of post exposure delay before baking comprises an acid stable polymer which is insoluble in water but normally soluble in an aqueous alkaline medium, a photoinitiator which generates acid upon exposure to actinic radiation, and a mixed carbonate ester of tertiary butyl alcohol and a polyhydric phenol which is an acid labile compound which inhibits the dissolution of the normally soluble polymer in said alkaline medium. PA218100.RMD

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