C - Chemistry – Metallurgy – 07 – H
Patent
C - Chemistry, Metallurgy
07
H
260/230.35
C07H 17/08 (2006.01)
Patent
CA 1192542
ABSTRACT OF THE DISCLOSURE The invention as disclosed relates to deformyltylosin derivatives of the formula Image wherein A is a Image , -CH=CH- or -CH2-CH3 - group, R1 is a hydrogen atom, or lower alkanoyl or aryl-lower alkanoyl group, X1 and X2 are hydrogen atoms or are connected to form a valence bond, Y1 and Y2 are hydrogen atoms or are connected to form a valence bond, Q1 is a hydrogen atom or methyl group, Q2 is a hydrogen atom or Image wherein R2 is a hydrogen atom or lower alkanoyl group, R is a hydrogen atom or Image group, wherein R3 is a hydrogen atom or C2-5 alkanoyl group, and R4 is a hydrogen atom or a C2-C6 alkanoyl group, and when R3 is not a hydrogen atom, R4 is not a hydrogen atom; or a salt thereof.
360427
Fujiwara Tatsuro
Honda Eiichi
Matsuda Tetsuo
Okegawa Osamu
Sakakibara Hideo
Gowling Lafleur Henderson Llp
Toyo Jozo Kabushiki Kaisha
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