C - Chemistry – Metallurgy – 08 – L
Patent
C - Chemistry, Metallurgy
08
L
400/5150, 400/54
C08L 23/00 (2006.01) C08K 5/00 (2006.01) C08K 5/098 (2006.01) C08L 23/04 (2006.01) C08L 23/10 (2006.01) C08L 23/18 (2006.01) C08L 73/00 (2006.01)
Patent
CA 2019934
Abstract of the Disclosure Photodegradable polymer mixtures which comprise a polyolefin prepared by low pressure synthesis; a copolymer containing ethylene, carbon monoxide and, if appropriate, further polymerizable components; and small amounts of a carboxylic acid salt of an element of atomic number 22 to 58. The polymer mixture contains 0.5 to 5% by weight of carbon monoxide. The presence of both the copolymer containing carbon monoxide and the carboxylic acid salt improves the degradability of the resultant mixture.
Hobes John
Payer Wolfgang
Hoechst Aktiengesellschaft
Macrae & Co.
LandOfFree
Degradable polymer mixtures does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Degradable polymer mixtures, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Degradable polymer mixtures will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1775671