Dense fluid photochemical process for substrate treatment

Details Dense fluid photochemical process for substrate treatment Dense fluid photochemical process for substrate treatment

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B01J 19/12 (2006.01) B08B 3/12 (2006.01) B08B 7/00 (2006.01) C23G 5/00 (2006.01) H01L 21/00 (2006.01) H05K 3/26 (2006.01)

Patent

CA 2009748

DENSE FLUID PHOTOCHEMICAL PROCESS FOR SUBSTRATE TREATMENT ABSTRACT A process for removing undesired material from a chosen substrate by exposing the substrate simultaneously to ultraviolet radiation and a selected dense fluid, wherein the radiation produces a photochemical reaction that removes the undesired material from the substrate and the dense fluid enhances the removal of the undesired material. In an alternative embodiment, a reactive agent may additionally be used. The process may be used to remove contaminants from a substrate, etch a substrate surface, or destroy toxic organic material in industrial wastes.

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