Depilatory compositions

A - Human Necessities – 61 – K

Patent

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Details

A61K 8/46 (2006.01) A61Q 9/04 (2006.01)

Patent

CA 2609779

The present invention is directed to dual phase and single phase depilatory compositions and methods of using said compositions. More specifically, the present invention is directed to a dual phase composition for the removal of hair comprising a first acidic phase containing a thiol-based depilatory agent and a second alkaline phase containing a pH buffer. The present invention is also directed to a single phase depilatory composition comprising 2- aminoehtanethiol and a pH buffer and an advantageous packaging means for said single phase depilatory composition.

La présente invention concerne des compositions dépilatoires à deux phases et à phase unique et les procédés d'utilisation desdites compositions. Plus spécifiquement, la présente invention concerne une composition à deux phases destinée à éliminer les poils, comprenant une première phase acide contenant un agent dépilatoire à base de thiol et une seconde phase alcaline contenant un tampon de pH. La présente invention concerne également une composition dépilatoire à phase unique comprenant le 2-aminoéthanethiol et un tampon de pH et un moyen de conditionnement avantageux destiné à ladite composition dépilatoire à phase unique.

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