Depositing an electrical insulator with unidirectional gas...

C - Chemistry – Metallurgy – 23 – C

Patent

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204/96.09, 204/1

C23C 14/38 (2006.01) C23C 14/56 (2006.01) C23C 16/54 (2006.01) H01L 21/00 (2006.01) H01L 21/677 (2006.01)

Patent

CA 1289512

ABSTRACT A system and method for depositing an elec- trical insulator over a substrate are disclosed. The system includes first, second, and third cham- bers, the second chamber being a deposition cham- ber for depositing the insulator over the sub- strate. A plurality of gas gates communicate the second chamber with the first chamber, and the second chamber with the third chamber in series relation. An endless conveyor in each of the chambers transports the substrate through the chambers in succession. A plurality of absolute pressure control pumps maintain unidirectional gas flow from the first and third chambers into the second chamber to maintain a desired degree of isolation, which may be expressed as a concentra- tion ratio of the gas constituents between the chambers.

514424

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