Deposition heaters

Details Deposition heaters Deposition heaters

C - Chemistry, Metallurgy

23

C

C23C 16/00 (2006.01) C23C 14/24 (2006.01) F27B 14/10 (2006.01) F27B 14/12 (2006.01) F27B 14/14 (2006.01) F27D 99/00 (2010.01) F27B 14/00 (2006.01)

Patent

CA 2066573

ABSTRACT OF THE DISCLOSURE A gaseous deposition source for providing a deposition material that emanates from a crucible (10) having multiple thin film heating elements (22,24) formed thereon, with each adjacent pair being separated by an insulating layer (23) therebetween. A gaseous deposition source can have a crucible (10) with a cover (11) thereon with one or more apertures (19) therein and with thin film heating elements (22',24') on that cover about such apertures. A substrate heater (11 without apertures 19) may be used formed of thin film heating elements provided on a base.

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