Deposition of titanium aluminides

Details Deposition of titanium aluminides Deposition of titanium aluminides

C - Chemistry, Metallurgy

23

C

117/83

C23C 16/08 (2006.01) C23C 16/44 (2006.01) C23C 16/448 (2006.01)

Patent

CA 1309903

ABSTRACT There is disclosed a method for producing titanium aluminide coating on a substrate surface in which the step of supporting the substrate with the surface to be coated in a reactor chamber is used, and a flow of gaseous aluminum monochloride is provided as well as a flow of gaseous titanium trichloride, at gas temperatures of between about 800° C and about 1200°, over the surface of the substrate. The substrate surface is maintained at a temperature below the temperature of the gases sufficient to cause disproportionation of the gases to deposit titanium and aluminum on the substrate. There is also disclosed products having a titanium aluminide coating. The coatings are of use in metal matrix compositions.

521342

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