C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
117/85
C23C 16/34 (2006.01) C04B 41/50 (2006.01) C04B 41/87 (2006.01) C23C 16/36 (2006.01) C23C 16/46 (2006.01)
Patent
CA 2010120
Deposition process in the vapour phase at low temperature of a ceramic coating of the metallic nitride or carbonitride type ABSTRACT OF THE TECHNICAL CONTENT OF THE INVENTION The object of the invention is a one-step deposition process of a coating of the ceramic type based on nitrides or carbonitrides of at least one metallic element selected from Cr, V, Zr, W, Mo, Co, Mn, Ni, Hf and Ta on a metallic or ceramic substrate, massive or obtained from fibres, by deposition in the vapour phase wherein a coating is deposited on the substrate by a chemical means at a pressure lower than 10kPa at a temperature lower than 600°C and by using a system of precursors constituted simultaneously of: - an organo-metallic precursor of the said metallic element selected from the organo-metallic compounds of the sandwich type of general formula: Image - a nitrogen precursor selected from ammonia and hydrazine. Fig. None
Maury Francis
Morancho Roland
Nowak Jean-Francois
Schuster Frederic
C3f (compagnie Francaise de Forges Et Fonderies)
Nitruvid
Robic Robic & Associes/associates
LandOfFree
Deposition process in the vapour phase at low temperature of... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Deposition process in the vapour phase at low temperature of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Deposition process in the vapour phase at low temperature of... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1342442