C - Chemistry – Metallurgy – 30 – B
Patent
C - Chemistry, Metallurgy
30
B
148/2.4
C30B 25/14 (2006.01) C30B 25/02 (2006.01) C30B 29/40 (2006.01)
Patent
CA 1252695
- 21 - DEPOSITION TECHNIQUE Abstract Devices such as photodiodes based on III-V semiconductor materials have been made utilizing a CVD epitaxial procedure. This procedure includes, for example, the use of a combination of liquid and solid chloride transport sources.
474332
American Telephone And Telegraph Company
Kirby Eades Gale Baker
LandOfFree
Deposition technique does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Deposition technique, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Deposition technique will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1233998