C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/277, 260/301
C07D 285/10 (2006.01) C07D 213/38 (2006.01) C07D 213/81 (2006.01) C07D 271/06 (2006.01) C07D 271/08 (2006.01) C07D 271/10 (2006.01) C07D 277/28 (2006.01) C07D 277/40 (2006.01) C07D 277/42 (2006.01) C07D 277/48 (2006.01) C07D 277/56 (2006.01) C07D 307/52 (2006.01) C07D 417/12 (2006.01)
Patent
CA 1167841
Abstract of the Disclosure Histamine H2-antagonists of the formula Image I wherein p is 1 or 2; R1 is hydroxy, amino, substituted amino or a 5- to 7-membered fully saturated nitrogen- containing heterocyclic ring attached via its nitrogen atom; m is an integer of from 0 to 2; n is an integer of from 2 to 4; Z is sulfur, oxygen or methylene; and A is an optionally substituted phenyl, imidazolyl, thiazolyl, isothiazolyl, oxazolyl, isoxazolyl, triazolyl, thiadiazolyl, oxadiazolyl, furyl, thienyl or pyridyl ring; and nontoxic pharmaceutically acceptable salts, hydrates, solvates or N-oxides thereof are potent anti-ulcer agents. Inter- mediates and processes for their preparation are disclosed.
359493
Algieri Aldo A.
Crenshaw Ronnie R.
Bristol-Myers Squibb Company
Gowling Lafleur Henderson Llp
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