C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/357, 260/483
C07C 69/34 (2006.01) C07D 265/38 (2006.01) C12Q 1/34 (2006.01) C12Q 1/44 (2006.01)
Patent
CA 1285941
ABSTRACT The present invention provides a lipase substrate of the general formula:- Image wherein A is an alkylene or alkenylene radical contain- ing up to 16 carbon atoms, R and R1, which can be the same or different, each signify an alkyl, alkenyl or acyl radical containing up to 20 carbon atoms or an optionally alkyl-substituted aryl or aralkyl radical containing up to 8 carbon atoms in the alkyl moiety and wherein one of R and R1 can also be a hydrogen atom, X is the residue of an aromatic hydroxy or thiol compound, and each Y and Z, independently from each other, is -S- or -O-, Z also -CH2-. The present invention also provides a process and a reagent for the optical determination of lipase.
507790
Batz Hans-Georg
Junius Martina
Neumann Ulrich
Boehringer Mannheim Gmbh
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
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