C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/276.1
C07D 495/04 (2006.01) C07F 5/02 (2006.01) C07F 7/10 (2006.01)
Patent
CA 1182458
ABSTRACT OF THE DISCLOSURE The present invention provides derivatives of 5,6,7,7a-tetrahydro-4H-thieno[3,2-c]pyridin-2-one of the general formula: Image (I) in which R is a hydrogen atom or a phenyl radical, which is optionally substituted by at least one halogen atom or lower alkyl radical, lower alkoxy radical, nitro group, carboxyl group, alkoxycarbonyl radical or cyano group, R' is a hydrogen atom or a lower alkyl radical and n is 0, 1, 2, 3 or 4; and the addition salts thereof with pharmaceutically acceptable mineral or organic acids. The present invention also provides a process for the preparation of these compounds, as well as pharmaceutical compositions containing them. -1-
391052
Ashida Shinichiro
Boigegrain Robert
Maffrand Jean-Pierre
Matsubayachi Kynichi
Suzuki Norio
Goudreau Gage Dubuc
Sanofi
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