C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
400/1301, 96/172
C08F 2/50 (2006.01)
Patent
CA 1131395
Abstract Photopolymerizable compositions comprising a photopolymerizable monomer, an initiator, e.g., hexa- arylbiimidazole and a sensitizing amount of a selected compound derived from aryl ketones and p-dialkylamino- arylaldehydes. The photopolymerizable compositions which optionally contain inert components such as organic polymeric binders, solvents, etc. are photoactivated in the visible region of the spectrum. The photopolymeriz- able compositions are useful in lithographic and letter press printing plates, engineering drafting films, litho- graphic films, photoresists and solder masks.
327027
E. I. Du Pont de Nemours And Company
Mccallum Brooks & Co.
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