C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/299
C07D 498/04 (2006.01) C07D 503/00 (2006.01)
Patent
CA 1117532
ABSTRACT OF THE DISCLOSURE Compounds of the formula (I) are disclosed Image wherein R is a hydrogen atom or a methyl, methoxyl, hydroxymethyl, or nitrile group; R1 is a hydrogen atom or a lower alkyl, aralkyl, phenyl or inertly substituted lower alkyl, aralkyl or phenyl group; R2 is a hydrogen atom or a lower alkyl, aralkyl, phenyl or inertly substituted lower alkyl, aralkyl or phenyl group; and R3 is lower alkyl, aralkyl, phenyl or inertly substituted lower alkyl, aralkyl or phenyl group; any of said groups R1, R2 and R3 being optionally interlinked to form a ring of 5 - 7 ring atoms. Methods of preparation are also disclosed. The novel salts are useful in enhancing the effectiveness of penicillins and cephalosporins and have improved storage properties.
315415
Liberman Michael
Richardson Kenneth
Tedder John M.
Veal Kenneth T.
Beecham Group Limited
Borden Ladner Gervais Llp
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