C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/328.2
C07D 333/38 (2006.01)
Patent
CA 1113102
NEW DERIVATIVES OF CYSTEINE Abstract of the Disclosure This invention relates in the free form or in salts or esters form, new N,S-diacyl-L-cysteines in which at least one of the acetylating radicals is 2-thenoyl radical and par- ticularly N-acetyl, S-2-thenoyl cysteine and its esters. A process for manufacturing these new cysteines is claimed, as their utilization in therapeutic and cosmetological grounds.
270289
Blum Jean
Smart & Biggar
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