C - Chemistry – Metallurgy – 07 – H
Patent
C - Chemistry, Metallurgy
07
H
C07H 17/07 (2006.01)
Patent
CA 2559377
The invention relates to: (i) the use of osyl derivatives of genkwanin and sakuranetin having formula (I) in (a) cosmetics or dermatology and (b) therapeutics; (ii) the use of novel derivatives having formula (I) as industrial products; and (iii) the production method thereof [Formula (I)], wherein symbol [Formula (II)] represents a single or double bond, R represents H or an osyl residue, particularly with structure S?1¿ or S?2¿ [Formula (III)], Z represents H, an alkyl group at C¿1?-C¿4?, acyl at C¿1?-C¿5?, monosaccharide or sulphate.
La présente invention concerne (i) l~utilisation en cosmétique ou dermatologie, d~une part, et en thérapeutique, d~autre part, des dérivés osylés de genkwanine et sakuranétine de formule (I) ci-après, (ii) des nouveaux dérivés de formule (I) en tant que produits industriels, et (iii) leur procédé de fabrication : Formule (I) dans laquelle, le symbole Formule (II) représente une simple ou une double liaison, R représente H ou un reste osyle, notamment de structure S1 ou S2 : Formule (III), Z représente H, un groupe alkyle en C1-C4, acyle en C1-C5, ose ou sulfate.
Prost Michel
Ragot Jacqueline
Tubery Pierre
Goudreau Gage Dubuc
Prost Michel
Ragot Jacqueline
Tubery Pierre
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