C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
167/18.4, 260/47
C07C 69/65 (2006.01) A01N 37/10 (2006.01) A01N 37/12 (2006.01) A01N 37/38 (2006.01) A01N 37/40 (2006.01) A01N 39/00 (2006.01) C07C 59/64 (2006.01) C07C 69/736 (2006.01)
Patent
CA 1239148
ABSTRACT OF THE DISCLOSURE: Disclosed herein are derivatives of phenylacetic ester represented by the formula(I): Image (I) wherein R1 represents a halogen atom or a lower alkoxy group; R2 represents a lower alkyl group; R3 represents a hydrogen atom or a methyl group; R4 represents a hydrogen atom, a lower alkyl group, -CH2-CH=CH2, -CH2-CH=CH-CH3, Image , -CH2OCH3, -CH2OCH2CH3, -CH2-O-CH2-CH=CH2, -CH2-O-CH2-C?CH, -CH2-O-CH2- C?C-CH3, -COCH3, -CH2-O-COCH3, -COOCH3, Image , Image or Image and R5 represents a hydrogen atom or a halogen atom, a process for producing the derivatives and an insecticidal composition containing the derivatives of phenylacetic ester as an active ingredient.
486091
Akiba Uichi
Enari Hiroyuki
Ito Masayo
Konai Yutaka
Goudreau Gage Dubuc
Kureha Kagaku Kogyo Kabushiki Kaisha
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