C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/357.3, 260/4
C07C 69/30 (2006.01) C07C 69/00 (2006.01) C07C 69/63 (2006.01) C07D 309/30 (2006.01)
Patent
CA 1338017
A compound represented by the following general formula: Image wherein R1 and R2 are the same or different, and represent a hydrogen or halogen, and ring-opened free acid, amides and salts thereof are provided. The present invention also provides a process for the production of the above-mentioned compound starting from the known compound ML-236B.
596076
Endo Akira
Inaba Takashi
Inoue Tsutomu
Toshioka Tadashi
Umezawa Isao
Mcfadden Fincham
Tobishi Yakuhin Kogyo Kabushiki Kaisha
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