C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/315.25
C07D 233/60 (2006.01)
Patent
CA 1077493
ABSTRACT OF THE DISCLOSURE Compounds of the formula Image (I) wherein R1 and R2 are each independently phenyl, phenyl straight chain lower alkyl or phenyl straight chain lower alkenyl or one of the above substituted in the phenyl ring with one or more substituents independently selected from the group consisting of lower alkyl of from one to four carbon atoms, halo and trifluoromethyl; X is oxygen or sulfur; n is an integer of from 1 to 8 with the proviso that n is not 1 when R1 is phenyl or substituted phenyl; and the antimicrobial acid addition salts thereof are useful as antifungal, antibacterial and antiprotozoal agents.
257718
Syntex (u.s.a.) Llc.
Walker Keith A. M.
LandOfFree
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