Developer compositon for lithographic plates including...

Details Developer compositon for lithographic plates including... Developer compositon for lithographic plates including...

B - Operations, Transporting

41

C

96/54

B41C 1/10 (2006.01) G03F 7/32 (2006.01)

Patent

CA 1140787

ABSTRACT OF THE DISCLOSURE The invention is a developer composition for developing lithographic plates bearing a photosensitive photo-crosslinkable polymer having in its main chain a group of formula wherein X and Y independently represent a hydrogen atom, a halo- gen atom, a cyano group or a nitro group and n is an integer 1 or 2. The developer composition comprises ethylene glycol mono- phenyl ether and at least one acid selected from the group con- sisting of mineral acids, organic carboxylic acids and organic sulfonic acids.

342354

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