G - Physics – 03 – F
Patent
G - Physics
03
F
96/58
G03F 7/32 (2006.01)
Patent
CA 1200411
ABSTRACT The invention relates to an aqueous-alkaline developer for an irradiated radiation-sensitive negative-working reproduction layer, which developer is based on water, an anionic surfactant, at least one inorganic salt having an alkaline reaction and at least one aliphatic dicarboxylic acid or a salt thereof, wherein the developer having a pH of from about 8 to 12 comprises a) from about 0.05 to 10% by weight of a sodium, potassium or lithium salt of octyl, decyl or dodecyl monosulfate, b) from 0.001 to 5% by weight of a sodium, potassium or ammonium metasilicate, c) from 0.1 to 15% by weight of a sodium, potassium, lithium or ammonium borate, d) from 0.01 to 5% by weight of an aliphatic dicarboxylic acid or a sodium, potassium or ammonium salt thereof and e) from 0.5 to 12% by weight of a di- or tri-sodium or potassium phosphate and the weight ratio of sodium ions to potassium ions in the developer ranges from 1:1 to 1.4:1 and a method of developing reproduction layers using the above aqueous alkaline developer. The invention provides an aqueous alkaline developer with a relatively slow development speed and alleviates the problems of aluminum corrosion, foaming and precipitation when used in development machinery.
432428
American Hoechst Corporation
Fetherstonhaugh & Co.
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